Xianhe Liu
Physics and Astronomy · University of Michigan
Publications
74
Citations
1,432
Est. group size
~3
Recurring co-author estimate
Active years
32
Publishing since 1994
Typically publishes in teams of ~5 · 15% small-team papers (≤3 authors) · across 22 venues
- Recent Advances in Device-Level Thermal Management Technologies for Wide Bandgap Semiconductor: A Review
IEEE Transactions on Electron Devices · 2025
- Engineering Quantum Emitters in 2D Materials
Advanced Optical Materials · 2025
- 2 kV <b> <i>β</i> </b> -Ga2O3 Schottky diode with HfO2/SiO2 dual-layer field plate and mesa termination
Applied Physics Letters · 2025
- Optimizing Extreme Ultraviolet Lithography Process Metrics and Aberrations in the Cut Layer Through Source Mask Co-Optimization(SMO)
2025
- A computational design of AlGaN-based deep ultraviolet photonic crystal light-emitting diodes by tuning the band-edge resonance
Journal of Applied Physics · 2025
- Electrocatalytic nitrogen reduction to ammonia at low overpotentials based on tungsten carbide doped by non-precious metal single cobalt atoms
Chemical Engineering Journal · 2024
- Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method
IEEE Access · 2024
- Cobalt-iron Co-doped ammonium phosphomolybdate for electrocatalytic oxygen evolution in acidic electrolyte
International Journal of Hydrogen Energy · 2024
- A Study of the Via Pattern Lithography Process Window Under the 7 NM Logic Design Rules With 193 NM Immersion Lithography
2024
- Electrocatalytic Nitrogen Reduction to Ammonia at Low Overpotentialsbased on Tungsten Carbide Doped By Non-Precious Metal Single Cobalt Atoms
SSRN Electronic Journal · 2024
- A Study on Cross-Level Interconnection of Metal Layers Under 193 Immersion Lithography Conditions
2024
- Source-mask co-optimization study for typical EUV design rule patterns with 40nm minimum pitch
2024
- The Analysis of Optical Critical Dimension (OCD) Signal Strength Between 5 nm FinFET and 3 nm Complementary FET (CFET) Vertical Gate Stacks
2023
- An optical critical dimension (OCD) model analysis on 3nm complementary FET (CFET) gate stacks
2023
- A study of 3nm CFET middle-of-the-line contact layer OCD measurement sensitivity
2023
- Applied Physics Letters×5
- Photonics Research×3
- Optics Express×3
- Conference on Lasers and Electro-Optics×3
- IEEE photonics journal×2
- Ayush Pandey
Physics and Astronomy · University of Michigan
- Brandon Dzuba
Physics and Astronomy · Purdue University West Lafayette
- Yury Turkulets
Physics and Astronomy · University of Michigan
- Zetian Mi
Physics and Astronomy · University of Michigan
- Elaheh Ahmadi
Physics and Astronomy · University of Michigan
This profile was generated automatically from public scholarly data (OpenAlex). Group size and activity levels are estimates derived from co-authorship patterns.
Last updated Jul 25, 2026.
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