Thomas Kubley

Materials Science · University of Michigan

Mid career · publishing since 2015

Fusion materials and technologies Ion-surface interactions and analysis Silicon Carbide Semiconductor Technologies Silicon and Solar Cell Technologies Geology and Paleoclimatology Research

Publications

Citations

226

Est. group size

—

Recurring co-author estimate

Active years

Publishing since 2015

In context

Among 438 mid career Materials Science PIs within our index

Citations: 226cohort median 778

Publications / year (recent): 0.8cohort median 3

Typically publishes in teams of ~10 · 0% small-team papers (≤3 authors) · across 3 venues

Publication cadence

Publications per year over the last 10 years — averaging 0.8/year recently

Recent publications

High-Energy Ion Implantation Using Electrostatic Accelerators
The Materials Research Society series · 2025
Analysis of Lattice Damage in 4H-SiC Epiwafers Implanted with High Energy Al Ions with Silicon Energy-Filter for Ion Implantation
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2025
Analysis of Lattice Strain in 4H-SiC Epiwafers Implanted with High Energy Al Ions with Silicon Energy-Filter for Ion Implantation
ECS Meeting Abstracts · 2025

Publishes in

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms×3
Journal of Instrumentation×1
Physics Procedia×1
Journal of Nuclear Materials×1
The Materials Research Society series×1

Similar researchers

By research-topic overlap

Ovidiu Toader
Materials Science · University of Michigan
Priyam Patki
Materials Science · Purdue University West Lafayette
Fei Gao
Materials Science · University of Michigan
A. Hassanein
Materials Science · Purdue University West Lafayette
Ning Gao
Materials Science · University of Michigan

This profile was generated automatically from public scholarly data (OpenAlex). Group size and activity levels are estimates derived from co-authorship patterns.

Last updated Jul 25, 2026.

Claim or correct this profile