Mark J. Kushner
Engineering · University of Michigan
Publications
880
Citations
24,034
Est. group size
~7
Recurring co-author estimate
Active years
52
Publishing since 1975
Typically publishes in teams of ~4 · 24% small-team papers (≤3 authors) · across 29 venues
- Consequences of secondary electron emission on charging of SiO2 features in capacitively coupled plasmas having sinusoidal and tailored bias waveforms
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2026
- Modeling remote inductively coupled plasmas for plasma-enhanced atomic layer deposition
Plasma Sources Science and Technology · 2026
- Supplementary Material: Surface Reactions for Cryogenic Etching of SiO2 with a CF4/H2/Ar Plasma
AIP Publishing · 2026
- Reaction mechanism for HF based cryogenic plasma etching of SiO2
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2026
- Supplementary Material: Surface Reactions for Cryogenic Etching of SiO2 with a CF4/H2/Ar Plasma
AIP Publishing · 2026
- Consequences of pulsing low frequency biases in inductively coupled plasmas on ion energy distributions for high aspect ratio plasma etching
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2026
- Development of a Be reaction mechanism for plasma modelling
Plasma Physics and Controlled Fusion · 2026
- Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2025
- 2D photofragmentation LIF imaging of H <sub>2</sub> O <sub>2</sub> and HO <sub>2</sub> in the effluent of an atmospheric-pressure plasma jet: effects of solid and liquid interfaces
Journal of Physics D Applied Physics · 2025
- Use of an auxiliary electrode to control plasma properties at the wafer edge in inductively coupled plasmas with a substrate bias
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2025
- Two-dimensional mapping of absolute OH densities in an atmospheric pressure plasma effluent via planar laser-induced fluorescence: effects of He/H<sub>2</sub>O and He/O<sub>2</sub> mixtures in N<sub>2</sub> and air, with and without solid targets
Journal of Physics D Applied Physics · 2025
- Controlling plasma produced fluxes to liquid surfaces by acoustic structuring: applications to plasma driven solution electrochemistry
Plasma Sources Science and Technology · 2025
- EUV-induced low pressure hydrogen and H <sub>2</sub> /Sn plasmas
Plasma Sources Science and Technology · 2025
- Ignition of non-equilibrium methane dielectric barrier discharges in a multiphase plasma–liquid microfluidic device
Lab on a Chip · 2025
- Oxygenates production in a microfluidic dielectric barrier discharge device sustained in Ar/CH4/O2
Journal of Applied Physics · 2025
- Bulletin of the American Physical Society×40
- Plasma Sources Science and Technology×26
- Journal of Physics D Applied Physics×24
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films×22
- Journal of Applied Physics×15
- John E. Foster
Engineering · University of Michigan
- Tugba Piskin
Engineering · University of Michigan
- Astrid Raisanen
Engineering · University of Michigan
- Amanda M. Loveless
Engineering · Purdue University West Lafayette
- Scott Doyle
Engineering · University of Michigan
This profile was generated automatically from public scholarly data (OpenAlex). Group size and activity levels are estimates derived from co-authorship patterns.
Last updated Jul 25, 2026.
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