LabCompass

David F. Bahr

Engineering · Purdue University West Lafayette

OpenAlex ORCID
Established · publishing since 1990
Metal and Thin Film MechanicsMicrostructure and mechanical propertiesDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing TechniquesForce Microscopy Techniques and Applications

Publications

450

Citations

9,354

Est. group size

~3

Recurring co-author estimate

Active years

36

Publishing since 1990

Research summary
AI-generated

David F. Bahr studies the mechanical behavior of materials at small scales, including how metals, coatings, and molecular crystals deform, resist damage, and respond to processes like shot peening, hydrogen exposure, and additive manufacturing. His work combines nanoindentation and microstructural analysis techniques to understand material strength, corrosion resistance, and coating performance for applications ranging from electronics to explosives-related materials science.

Nanomechanics and nanoindentationMetal surface treatments (shot peening, hydrogen embrittlement)Additive manufacturing and cold spray coatingsCorrosion-resistant coatings for electronicsMechanical behavior of molecular/organic crystals

Publication output was highest around 2017 and has generally declined and leveled off since, averaging under five papers per year over the last five years.

Generated by claude-sonnet-5 from public bibliographic data · Jul 20, 2026

Publication cadence
Publications per year over the last 10 years — averaging 4.6/year recently
2017: 32 publications32172018: 9 publications182019: 9 publications192020: 13 publications202021: 8 publications212022: 4 publications222023: 6 publications232024: 10 publications242025: 3 publications2526
Recent publications
Publishes in
  • The Cambridge Structural Database×17
  • MRS Advances×7
  • Journal of materials research/Pratt's guide to venture capital sources×5
  • Surface and Coatings Technology×3
  • Crystals×3
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This profile was generated automatically from public scholarly data (OpenAlex). Group size and activity levels are estimates derived from co-authorship patterns.

Last updated Jul 20, 2026.

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